"Achieving improved optical thin film control and uniformity of silicon dioxide by using ion assisted deposition," Proc. Soc. Vac. Coaters, 36, 75-78 (1993).
"Some comparisons in the application of End-Hall and Cold Cathode ion sources in the conversion of SiO to SiO2," SPIE, Vol 2262 14-21(1994).
"Application of oxygen IAD using a new high-power gridless plasma source," EOS/SPIE, Vol 2776 Glasgow (1996).
"Getting Better Optical Coatings That Use Silica and Hafnia," Vacuum Coating & Technology, 3 30-35 (Jan. 2002).
"Comparison of Two Broad Beam Ion/Plasma Sources for Optical Coating," Vacuum Coating & Technology, 3 30-33 (Mar. 2002).
With K. Patel and R. Kaneriya,"Improved Magnesium Fluoride Process by Ion-Assisted Deposition," Society of Vacuum Coaters Annual Technical Conference Proceedings, 53, 313-319 (2010).[Pdf]
"Behavior of three types of plasma sources for optical coating," Society of Vacuum Coaters Annual Technical Conference Proceedings, 54 (2011).[Pdf]
With Shakoury, Sainty, and Katel, "Comparison of Three Different Ion Sources and the Effects of Additional Neutralizer Current," Submitted to Society of Vacuum Coaters Annual Technical Conference Proceedings, 60 (2017).[Pdf]Return to Publications List