"Achieving improved optical thin film control and uniformity of silicon dioxide by using ion assisted deposition," Proc. Soc. Vac. Coaters Techcon, 36, 75-81 (1993).
"Some comparisons in the application of End-Hall and Cold Cathode ion sources in the conversion of SiO to SiO2," SPIE, 2262 14-21 (1994).
"Application of oxygen IAD using a new high-power gridless plasma source," EOS/SPIE, Vol 2776 Glasgow (1996).
"Getting Better Optical Coatings That Use Silica and Hafnia," Vacuum Coating & Technology, 3 30-35 (Jan. 2002).
"Comparison of Two Broad Beam Ion/Plasma Sources for Optical Coating," Vacuum Coating & Technology, 3 30-33 (Mar. 2002).